JPS6131864B2 - - Google Patents

Info

Publication number
JPS6131864B2
JPS6131864B2 JP59377A JP59377A JPS6131864B2 JP S6131864 B2 JPS6131864 B2 JP S6131864B2 JP 59377 A JP59377 A JP 59377A JP 59377 A JP59377 A JP 59377A JP S6131864 B2 JPS6131864 B2 JP S6131864B2
Authority
JP
Japan
Prior art keywords
pattern
film
mask
double
reversal film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59377A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5386650A (en
Inventor
Masami Kikuchi
Toshio Kojima
Hiroshi Asada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP59377A priority Critical patent/JPS5386650A/ja
Publication of JPS5386650A publication Critical patent/JPS5386650A/ja
Publication of JPS6131864B2 publication Critical patent/JPS6131864B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
JP59377A 1977-01-07 1977-01-07 Photooetching method of both surface Granted JPS5386650A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59377A JPS5386650A (en) 1977-01-07 1977-01-07 Photooetching method of both surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59377A JPS5386650A (en) 1977-01-07 1977-01-07 Photooetching method of both surface

Publications (2)

Publication Number Publication Date
JPS5386650A JPS5386650A (en) 1978-07-31
JPS6131864B2 true JPS6131864B2 (en]) 1986-07-23

Family

ID=11478025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59377A Granted JPS5386650A (en) 1977-01-07 1977-01-07 Photooetching method of both surface

Country Status (1)

Country Link
JP (1) JPS5386650A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197182U (en]) * 1987-06-10 1988-12-19
JPH0191584U (en]) * 1987-12-10 1989-06-15
JPH0675211U (ja) * 1993-04-02 1994-10-25 久喜 小川 クリップ

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003072967A1 (fr) * 2002-02-28 2003-09-04 Fujitsu Limited Procede de fabrication de palier sous pression dynamique, palier sous pression dynamique, et dispositif de fabrication de palier sous pression dynamique

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197182U (en]) * 1987-06-10 1988-12-19
JPH0191584U (en]) * 1987-12-10 1989-06-15
JPH0675211U (ja) * 1993-04-02 1994-10-25 久喜 小川 クリップ

Also Published As

Publication number Publication date
JPS5386650A (en) 1978-07-31

Similar Documents

Publication Publication Date Title
US3169063A (en) Method of making printed circuits
US3264105A (en) Method of using a master art drawing to produce a two-sided printed circuit board
US3877808A (en) Printed circuit board exposure holding device
US3769895A (en) Masking for printed circuit photomasters
JPS6131864B2 (en])
JPH0323457A (ja) フォトツール
JPS59141230A (ja) パタ−ン形成方法
US3829213A (en) Artproof method for semiconductor devices
EP0286018A3 (de) Vorlagenmaterial für die Belichtung von lichtempfindlich beschichteten Materialien
JPS60176041A (ja) シヤドウマスク用パタ−ン版の製造方法
JPS6386550A (ja) 多層配線層の形成方法
JPH019954Y2 (en])
JPH03108790A (ja) プリント配線板の露光方法
JPS59152443A (ja) フオトマスクの位置合わせマ−ク形成法
JPS6141089Y2 (en])
US3794492A (en) Process for producing an image bearing screen transparency
JP2568593Y2 (ja) 露光装置用ピン
JPH0461110A (ja) 文字パターンの視認性向上方法
JPH05323570A (ja) フォトマスクおよびその製造方法
JPS6092619A (ja) 半導体ウエフアのマスク位置決め法
KR950019906A (ko) 반도체 소자 제조용 노광 마스크
JPH08213302A (ja) 微細加工方法及びこの加工方法に用いる微細加工用フォトマスク
JPS59125733A (ja) フオトマスク
JPS5986221A (ja) 特殊基準マ−クを用いたマスクのアライメント方法
JPH01245258A (ja) フォトマスク